High quality CVD graphene
A widely followed technique to produce high-quality graphene for large scale applications is chemical vapor deposition (CVD).
The key advantages of CVD graphene are: 1) the ease of transfer onto any substrate of choice, 2) charge density homogeneity and tunable functionality using a back gate i.e. without additional sample treatment procedures and 3) the wide choice of growth substrate and gas precursors.
We characterize our graphene films using large area Raman mapping, XPS, LEEM and electrical transport measurements. Furthermore, we are able to tune the size of individual graphene grains from tens of micrometers to millimetre scale.”
a) Comparative study of single and multi domain CVD graphene using large-area Raman mapping and electrical transport characterization Kishan Thodkar, Maria El Abbassi, Felix Lüönd, Frédéric Overney, Christian Schoenenberger, Blaise Jeanneret, and Michel Calame. physica status solidi (RRL) – Rapid Research Letters, 10(11), 807-811, 2016
b) Restoring the electrical properties of CVD graphene via physisorption of molecular adsorbates Kishan Thodkar, Damien Thompson, Felix Lüönd, Lucas Moser, Frédéric Overney, Laurent Marot, Christian Schönenberger, Blaise Jeanneret, and Michel Calame. ACS Applied Materials & Interfaces, 2017
c) High quality CVD graphene for quantum Hall resistance standards, to be submitted.