The scanning electron microscope of the future is called a FIB (Focused Ion Beam). A scanning ion microscope, originally developed for semiconductor applications, the FIB not only allows to generate highresolution images of a sample in different modes, but also to machine it on a microscopic scale. The primary, scanned Gallium ion beam is used to make spatially precise micro-sections in the sample, which can be inspected and analyzed in situ. It is also possible to deposit precisely targeted electrically conducting or insulating layers with the FIB (see the article "Five-fold better insulation with vacuum"). Other applications are the failure analysis and repair of ULSIs (Ultra Large Scale Integrated Circuits), and the characterization of thin films and surface wear in the material science field. Empa operates two FIB systems, covering the complete application spectrum, with current research projects as well as futureoriented, high-performance industrial applications given high priority.

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Dr Urs Sennhauser, Electronics / Metrology, Phone: +41 (0)44 823 41 73, e-mail: urs.sennhauser@empa.ch

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